The future of semiconductor technology is often viewed through the lenses of photolithography equipment, which continues to offer better resolution for future process nodes despite an almost perpetual ...

Optical metasurfaces to perform optical analog spatial differentiation operations and image edge detection processing is a currently hot topic. However, some metasurface differentiators are limited by ...

Intel has been in the news lately for being the first semiconductor fab to jump aboard the high numerical aperture (high-NA) fabrication train. The company is the first of the big fabs to buy a ...

Each low-numerical aperture (NA) extreme ultraviolet (EUV) lithography system costs over US$100 million, making it one of the most expensive semiconductor manufacturing tools in history. This raises a ...

High Numerical Aperture (NA) lithography machines just became available earlier this year. Intel was the first global foundry to purchase one in an attempt to one-up its rivals in the race to ...

Seoul, September 3, 2025 – SK hynix Inc. announced it has assembled what the company said is the industry’s first high numerical aperture extreme ultraviolet lithography (NA EUV) lithography system ...

ASML is on track to ship the industry's first extreme ultraviolet (EUV) lithography scanner with a 0.55 numerical aperture (NA) this year. Company CEO Peter Wennink said that ASML's Twinscan EXE:5000 ...

SAN JOSE, California (Reuters) - (This Feb. 24 story has been corrected to say that Intel is using 18A manufacturing technology to test the high NA tools, not using high NA machines to develop 18A ...